Author Affiliations
Abstract
1 State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China
2 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200092, China
3 Department of Electrical and Computer Engineering, The University of British Columbia, Vancouver, British Columbia V6T 1Z4, Canada
4 e-mail:
5 e-mail:
A tunable optical delay line (ODL) featuring high switching speed and low optical loss is highly desirable in many fields. Here, based on the thin-film lithium niobate platform, we demonstrate a digitally tunable on-chip ODL that includes five Mach–Zehnder interferometer optical switches, four flip-chip photodetectors, and four delay-line waveguides. The proposed optical switches can achieve a switching speed of 13 ns and an extinction ratio of 34.9 dB. Using a modified Euler-bend-based spiral structure, the proposed delay-line waveguide can simultaneously achieve a small footprint and low optical propagation loss. The proposed ODL can provide a maximum delay time of 150 ps with a resolution of 10 ps and feature a maximum insertion loss of 3.4 dB.
Photonics Research
2022, 10(11): 2575
Author Affiliations
Abstract
State Key Laboratory of Optoelectronic Materials and Technologies and School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510000, China
Integrated traveling-wave lithium niobate modulators need relatively large device lengths to achieve low drive voltage. To increase modulation efficiency within a compact footprint, we report an integrated Fabry–Perot-type electro-optic thin film lithium niobate on insulator modulator comprising a phase modulation region sandwiched between two distributed Bragg reflectors. The device exhibits low optical loss and a high tuning efficiency of 15.7 pm/V. We also confirm the modulator’s high-speed modulation performance by non-return-to-zero modulation with a data rate up to 56 Gbit/s.
integrated optic devices lithium niobate optical modulators microstructure fabrication 
Chinese Optics Letters
2021, 19(6): 060003
Author Affiliations
Abstract
1 State Key Laboratory of Optoelectronic Materials and Technologies and School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510000, China
2 Centre for Optical and Electromagnetic Research, Guangdong Provincial Key Laboratory of Optical Information Materials and Technology, South China Academy of Advanced Optoelectronics, South China Normal University, Higher-Education Mega-Center, Guangzhou, China
3 Department of Electronic and Information Engineering, Photonics Research Centre, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, China
4 State Key Laboratory for Modern Optical Instrumentation, Centre for Optical and Electromagnetic Research, Zhejiang Provincial Key Laboratory for Sensing Technologies, Zijingang Campus, Zhejiang University, Hangzhou 310058, China
Optical modulators have been and will continue to be essential devices for energy- and cost-efficient optical communication networks. Heterogeneous silicon and lithium niobate modulators have demonstrated promising performances of low optical loss, low drive voltage, and large modulation bandwidth. However, DC bias drift is a major drawback of optical modulators using lithium niobate as the active electro-optic material. Here, we demonstrate high-speed and bias-drift-free Mach–Zehnder modulators based on the heterogeneous silicon and lithium niobate platform. The devices combine stable thermo-optic DC biases in silicon and ultra-fast electro-optic modulation in lithium niobate, and exhibit a low insertion loss of 1.8 dB, a low half-wave voltage of 3 V, an electro-optic modulation bandwidth of at least 70 GHz, and modulation data rates up to 128 Gb/s.
Photonics Research
2020, 8(12): 12001958

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